Sensor Technology and Devices / Edition 1

Sensor Technology and Devices / Edition 1

by Ljubisa Ristic
ISBN-10:
0890065322
ISBN-13:
9780890065327
Pub. Date:
03/01/1994
Publisher:
Artech House, Incorporated
ISBN-10:
0890065322
ISBN-13:
9780890065327
Pub. Date:
03/01/1994
Publisher:
Artech House, Incorporated
Sensor Technology and Devices / Edition 1

Sensor Technology and Devices / Edition 1

by Ljubisa Ristic

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Overview

"A results-oriented book. Quality line drawings, lucid photography, and informative graphs are used generously... The theoretical rigor of each chapter amply supports the real-world design examples that follow". -- Sensors Magazine

"One of the few sources to offer such comprehensive coverage". -- IEEE Electrical Insulation


Product Details

ISBN-13: 9780890065327
Publisher: Artech House, Incorporated
Publication date: 03/01/1994
Pages: 540
Product dimensions: 6.00(w) x 9.00(h) x 1.38(d)

Table of Contents

Prefacexiii
Chapter 1Sensing the Real World
1.1Introduction1
1.2Sensor Classification2
1.3Sensor Parameters3
1.4A Seamless Sensor System4
1.5Sensor Industry Growth6
1.6Summary8
References11
Chapter 2Modeling and Simulation of Microsensors and Actuators
2.1Introduction13
2.2Modeling Equations14
2.2.1The Basic Semiconductor Equations14
2.2.2Boundary Conditions16
2.2.3Simplification of the Problem17
2.2.4Combination of Mechanical and Electrical Effects18
2.3Discretization Procedures20
2.3.1Accelerated Nonlinear Procedures21
2.3.2Methods of Solution and Grid Generation22
2.3.3Equation Discretization26
2.3.4Error Checking29
2.4Results and Discussion30
2.4.1Hall Devices30
2.4.2Magnetotransistor33
2.4.3Micromachined Flow Sensor36
2.4.4Dynamic Microstructures39
2.5Summary43
References43
Chapter 3Bulk Micromachining Technology
3.1Introduction49
3.2Basic Concept of Bulk Micromachining50
3.2.1Silicon as a Mechanical Material50
3.2.2Wet Anisotropic Etching51
3.2.3Anisotropic Etchants59
3.2.4Etch-Stop Mechanisms69
3.3CMOS Technology and Bulk Micromachining76
3.3.1CMOS Processing76
3.3.2Micromechanical Structures in CMOS Processing77
3.4Applications of Bulk Micromachining82
3.4.1Bulk Micromachined Accelerometer82
3.4.2Thermal Infrared Sensor84
3.4.3Inductors in CMOS Technology86
3.5Summary89
References90
Chapter 4Surface Micromachining Technology
4.1Introduction95
4.2Basic Concept of Surface Micromachining Technology96
4.2.1Layer Stacking96
4.2.2Sealing98
4.3Polysilicon for Surface Micromachining99
4.3.1Deposition of Polysilicon100
4.3.2As-Deposited Film Stress105
4.3.3Annealing of Undoped Films107
4.3.4In-Situ Doping108
4.3.5Ex-Situ Doping115
4.3.6Sacrificial Layers and Sacrificial Etching118
4.3.7Stiction124
4.4Mechanical Characterization of Polysilicon126
4.4.1Test Structures for In-Situ Characterization126
4.4.2Gradient of Residual Stress130
4.4.3Load-Response Characterization133
4.5Application of Surface Micromachining140
4.5.1Surface Micromachined Accelerometer140
4.5.2Electrostatically Driven Resonators143
4.5.3Integration of Surface Micromachined Structures--Processing Issues144
4.6LIGA Process146
4.7Summary149
References150
Chapter 5Silicon Direct Wafer Bonding
5.1Introduction157
5.2Mechanism of Direct Wafer Bonding159
5.2.1SiO[subscript 2]//SiO[subscript 2] Bonding160
5.2.2Si//Si Bonding164
5.3Processing Considerations168
5.3.1Interface Integrity168
5.3.2Bond Strength178
5.3.3Shaping Bonded Wafers180
5.3.4Microdefects in Bonded Wafers186
5.4Application of Direct Wafer Bonding to Sensors and Actuators192
5.4.1Threshold Pressure Switch192
5.4.2Pressure Sensor195
5.4.3Peristaltic Membrane Pump198
5.5Summary199
References199
Chapter 6Packaging for Sensors
6.1Introduction203
6.2Basic Considerations for Sensor Packaging204
6.3Wafer-Level Packaging207
6.3.1Glass-Sealed Technique208
6.3.2Anodic Bonding210
6.4Assembly Techniques212
6.4.1Die Bonding212
6.4.2Wire Bonding217
6.4.3Chip Coatings219
6.4.4Package Types220
6.5Packaging for Specific Applications227
6.5.1Pressure Sensor Packaging227
6.5.2Accelerometer Packaging235
6.6Summary237
References237
Chapter 7Magnetic Field Sensors Based on Lateral Magnetotransistors
7.1Introduction239
7.2Lateral Magnetotransistors240
7.2.1Combined Action of an Electric Field and a Magnetic Field241
7.2.2Lateral Magnetotransistor in CMOS Technology242
7.2.3Suppressed Sidewall Injection Magnetotransistor in CMOS Technology243
7.2.4Suppressed Sidewall Injection Magnetotransistor in Bipolar Technology255
7.2.5Offset in Magnetotransistors258
7.2.6Noise in Magnetotransistors260
7.2.7Surface Effects268
7.3Multidimensional Sensing270
7.3.1Lateral Magnetotransistor Sensitive to Magnetic Field Either Parallel or Perpendicular to the Chip Surface271
7.3.2Two-Dimensional Sensing273
7.3.3Three-Dimensional Sensing277
7.4Summary282
References282
Chapter 8Thermal Sensors
8.1Introduction287
8.2Bipolar Devices as Temperature Sensors288
8.2.1Diodes as Temperature Sensors289
8.2.2Bipolar Transistors as Temperature Sensors290
8.2.3Stability294
8.3Integrated Temperature Sensors in Bipolar Technology294
8.4Intrinsically Referenced Temperature Sensors300
8.5Temperature Sensors in CMOS Technology302
8.5.1Bipolar Transistors in CMOS Technology302
8.5.2Integrated Temperature Sensors in CMOS Technology Based on Bipolar Transistors304
8.5.3Temperature Sensors Based on MOS Transistors and Resistors307
8.5.4Temperature Sensors with Digital Output309
8.6Polysilicon Resistors311
8.7Summary313
References313
Chapter 9Planar Silicon Photosensors
9.1Introduction317
9.2Planar Silicon Photodiodes320
9.3Fundamentals of Photosensors322
9.3.1Material Properties322
9.3.2Quantum Efficiency326
9.3.3Collection Efficiency Models327
9.3.4Photocurrent330
9.3.5Noise Current331
9.3.6Response Time333
9.4Level of Integration334
9.5Summary337
References338
Chapter 10Charge Coupled Devices
10.1Introduction341
10.2Basic Concepts342
10.2.1CCD Charge Storage Fundamentals342
10.2.2CCD Architectures343
10.2.3Three-Phase CCD Example344
10.3Quantum Efficiency347
10.3.1QE Model348
10.3.2Quantum Yield and Photon Transfer Curve348
10.3.3Backside Illumination and Thinning350
10.3.4Details of Flashgate Theory352
10.3.5Thinning Technology and Backside Performance357
10.3.6Alternative Approaches for High QE358
10.4Charge Collection Efficiency360
10.5Charge Transfer Efficiency366
10.6Read Noise369
10.7Summary373
Acknowledgments374
References374
Chapter 11Sensors for the Automotive Industry377
11.1Introduction384
11.2Sensing Technology in Vehicle Systems384
11.2.1Manifold Absolute Pressure386
11.2.2Tire Pressure Sensor390
11.2.3Position, Rotation, and Speed Sensing391
11.2.4Flow399
11.2.5Accelerometers401
11.3Future Automotive Sensing407
11.3.1High-Temperature Operation407
11.3.2Liquid Level407
11.3.3Chemical Sensing408
11.3.4Oil Quality410
11.3.5Capability to Compute Rather than Sense410
11.3.6Vehicle Diagnostics412
11.3.7RF Sensor Applications413
11.3.8Future Sensor Requirements414
11.4Summary417
References418
Chapter 12Signal Processing for Micromachined Sensors
12.1Introduction421
12.2Sensing Methods421
12.2.1Piezoelectric Sensing422
12.2.2Piezoresistive Sensing424
12.2.3Capacitive Sensing428
12.3Open- and Closed-Loop Systems433
12.3.1Different Micromachined Structures--Mechanical Issues433
12.3.2Open-Loop Capacitive Sensing438
12.3.3Closed-Loop Capacitive Sensing440
12.4Integration446
12.4.1Integrated Pressure Sensor446
12.4.2Integrated Accelerometer446
12.4.3Dynamic Considerations448
12.4.4Shock Considerations450
12.4.5Self-Test Features452
12.4.6Testing and Trimming453
12.5Summary455
References455
Chapter 13Controlled Oscillators and Their Applicability to Sensors
13.1Introduction457
13.2Controlled Sinusoidal Oscillators458
13.2.1The Oscillator Circuit and Its Control Characteristics458
13.2.2Oscillator Amplitude and Frequency Transients461
13.2.3Interaction of the Frequency and Amplitude Controls463
13.2.4Sinusoidal Oscillators in Applications466
13.3Controlled Multivibrators467
13.3.1Multivibrators versus Sinusoidal Oscillators467
13.3.2Multivibrators with Operational Amplifiers468
13.3.3Switches in the Basic Multivibrator Circuits471
13.3.4One-Amplifier Multivibrator476
13.3.5Voltage-to-Frequency Converters479
13.3.6Current-to-Frequency Converters484
13.3.7Duty-Cycle Modulation504
13.3.8Controlled Multivibrators in Applications507
13.4Summary507
References508
About the Authors511
Index517
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