Photomask Fabrication Technology / Edition 1

by Banqiu Wu, Benjamin G. Eynon

Overview

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Photomasks are defect-free optical templates — the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.

This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

Product Details

ISBN-13:	9780071445634
Publisher:	McGraw Hill LLC
Publication date:	06/30/2005
Series:	Professional Engineering
Pages:	500
Product dimensions:	6.00(w) x 9.10(h) x 1.78(d)

About the Author

Benjamin G. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology.

Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.

Table of Contents

Introduction

Data Preparation and Design

Pattern Generation

Pattern Transfer

Photomask Metrology

Defect Control and Finishing

Inspection, Repair, and Cleaning

Resolution Enhancement Techniques

Water Fabrication Issues

Future Developments
Appendices
References