Transport Phenomena Chemical Processes

by Sunil Kumar Thamida

Overview

This book is about mathematical modeling of various transport phenomena processes related to chemical engineering mainly and it is also suitable for other engineering branches. This book provides the fundamentals of formulating the spatio-temporal governing equations such as Continuity equation, Navier-Stokes equation, convection-conduction-heat generation equation and convection-diffusion-reaction equation using a control volume method and appropriate constitutive relationship such as Newton's law of viscosity, Fourier's law of heat conduction and Fick's law of diffusion. Various properties of a fluid/medium such as density, viscosity, thermal conductivity, specific heat capacity figure in the resultant governing equations. Diffusivity concept is explained for a solute-solvent system. It is demonstrated how the non-dimensional numbers such as Reynolds number, Nusselt number, Prandtl Number, Sherwood number, Schmidt number are obtained through non-dimensionalizing the governing equations. It is followed by application of these equations to certain simple processes and obtaining analytical solutions to velocity, temperature and concentration profiles. The problems are treated as initial and boundary value problems (IBVP). Hence there is good amount of applied mathematics involved. Techniques such as separation of variables method and similarity variable transformation are introduced. All the examples are presented with a detailed derivation so that the reader may cross-check the solution with their own method. A few examples are presented that have a coupling among the above three phenomena of momentum, heat and solute (mass) transfer. For example viscous heating during a flow of viscous fluid has a coupling of momentum transfer and heat transfer. This book motivates the reader for self learning by practicing engineers or scientists as well as a reference book for undergraduate and graduate courses.

Product Details

ISBN-13:	9789387813717
Publisher:	Arts & Science Academic Publishing
Publication date:	06/30/2016
Sold by:	Barnes & Noble
Format:	eBook
Pages:	198
File size:	8 MB

About the Author

Sunil Kumar Thamida, Assistant Professor, is currently working as faculty in the Department of Chemical Engineering at National Institute of Technology, Warangal, India. He has 5 years of experience in Industrial Research & Development as scientist and 7 years of experience in Teaching and academic research. He has B.Tech in Chemical Engineering from Indian Institute of Technology, Madras, India. After that he has done M.E. from Indian Institute of Science, Bangalore and Ph.D from University of Notre Dame, USA. He has so far published several research articles in high impact journals. His areas of research are of wide variety such as Thin film flow, Process Scale-up, Microfluidics, Micro-electrokinetic flow, Nanoporous Anodic Alumina, Galvanic & Pitting Corrosion, Moving boundary problems, Lattice Boltzmann Method, Reactions in porous catalysts, Catalytic Reactive Distillation, Fluidized Bed Drying and Chemical Vapor Deposition. E-mail: [e-mail]
Sunil Kumar Thamida, Assistant Professor, is currently working as faculty in the Department of Chemical Engineering at National Institute of Technology, Warangal, India. He has 5 years of experience in Industrial Research&Development as scientist and 7 years of experience in Teaching and academic research. He has B.Tech in Chemical Engineering from Indian Institute of Technology, Madras, India. After that he has done M.E. from Indian Institute of Science, Bangalore and Ph.D from University of Notre Dame, USA. He has so far published several research articles in high impact journals. His areas of research are of wide variety such as Thin film flow, Process Scale-up, Microfluidics, Micro-electrokinetic flow, Nanoporous Anodic Alumina, Galvanic&Pitting Corrosion, Moving boundary problems, Lattice Boltzmann Method, Reactions in porous catalysts, Catalytic Reactive Distillation, Fluidized Bed Drying and Chemical Vapor Deposition. E-mail: [e-mail]