The unique compendium presents special principles and techniques of spectroscopic measurements that are used in semiconductor manufacturing.
Since industrial applications of spectroscopy are significantly different from those traditionally used in scientific laboratories, the design concepts and characteristics of industrial spectroscopic devices may vary significantly from conventional systems. These peculiarities are thus succinctly summarized in this volume for a wide audience of students, engineers, and scientific workers.
Exceptionally well-illustrated with practical solutions in detail, this useful reference text will open new horizons in new research areas.
Contents:
- Basics of Grating Spectrometers
- Basics of Fourier-Transform Spectrometers
- High-Resolution Spectroscopy
- Imaging Spectrometers
- Gated Intensified Spectrometers
- Modulation-Sensitive and Frequency-Selective Spectroscopy
- Optical Diagnostics in Plasma Etching Machines
- Spectral Reflectometry
- Related Non-spectroscopic Techniques
Readership: Researchers, professionals, academics, and graduate students in optical and laser physics, spectroscopy and other analytical techniques.
The unique compendium presents special principles and techniques of spectroscopic measurements that are used in semiconductor manufacturing.
Since industrial applications of spectroscopy are significantly different from those traditionally used in scientific laboratories, the design concepts and characteristics of industrial spectroscopic devices may vary significantly from conventional systems. These peculiarities are thus succinctly summarized in this volume for a wide audience of students, engineers, and scientific workers.
Exceptionally well-illustrated with practical solutions in detail, this useful reference text will open new horizons in new research areas.
Contents:
- Basics of Grating Spectrometers
- Basics of Fourier-Transform Spectrometers
- High-Resolution Spectroscopy
- Imaging Spectrometers
- Gated Intensified Spectrometers
- Modulation-Sensitive and Frequency-Selective Spectroscopy
- Optical Diagnostics in Plasma Etching Machines
- Spectral Reflectometry
- Related Non-spectroscopic Techniques
Readership: Researchers, professionals, academics, and graduate students in optical and laser physics, spectroscopy and other analytical techniques.
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SPECTROSCOPIC TECHNIQUES FOR SEMICONDUCTOR INDUSTRY
324![SPECTROSCOPIC TECHNIQUES FOR SEMICONDUCTOR INDUSTRY](http://img.images-bn.com/static/redesign/srcs/images/grey-box.png?v11.10.4)
SPECTROSCOPIC TECHNIQUES FOR SEMICONDUCTOR INDUSTRY
324eBook
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Product Details
ISBN-13: | 9789811257612 |
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Publisher: | WSPC |
Publication date: | 10/21/2022 |
Sold by: | Barnes & Noble |
Format: | eBook |
Pages: | 324 |
File size: | 60 MB |
Note: | This product may take a few minutes to download. |