Evolution of Thin Film Morphology: Modeling and Simulations / Edition 1

Evolution of Thin Film Morphology: Modeling and Simulations / Edition 1

by Matthew Pelliccione, Toh-Ming Lu
ISBN-10:
1441925805
ISBN-13:
9781441925800
Pub. Date:
11/19/2010
Publisher:
Springer New York
ISBN-10:
1441925805
ISBN-13:
9781441925800
Pub. Date:
11/19/2010
Publisher:
Springer New York
Evolution of Thin Film Morphology: Modeling and Simulations / Edition 1

Evolution of Thin Film Morphology: Modeling and Simulations / Edition 1

by Matthew Pelliccione, Toh-Ming Lu
$169.99
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Overview

Thin?lmdepositionisthemostubiquitousandcriticalof theprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties, which are often significantly different from bulk material properties. Precise control of morphology and microstructure during thin film growth is paramount to producing the - sired—lm quality for specific applications. To date, many thin film deposition techniques have been employed for manufacturing—lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of—lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random—uctuation, or noise, which is inherent to the deposition process, may create surface growth front roughness. The noise competes with surface smoothing processes, such as surface diffusion, to form a rough morphology if the experiment is performed at a sufficiently low temperature and / or at a high growth rate. In addition, growth front roughness can also be enhanced by growth processes such as geometrical shadowing. Due to the nature of the deposition process, atoms approaching the surface do not always approach in parallel; very often atoms arrive at the surface with an angular distribution.

Product Details

ISBN-13: 9781441925800
Publisher: Springer New York
Publication date: 11/19/2010
Series: Springer Series in Materials Science , #108
Edition description: Softcover reprint of hardcover 1st ed. 2008
Pages: 206
Product dimensions: 6.10(w) x 9.25(h) x 0.02(d)

Table of Contents

Description of Thin Film Morphology.- Surface Statistics.- Self-Affine Surfaces.- Mounded Surfaces.- Continuum Surface Growth Models.- Shastic Growth Equations.- Small World Growth Model.- Discrete Surface Growth Models.- Monte Carlo Simulations.- Solid-on-Solid Models.- Ballistic Aggregation Models.- Concluding Remarks.
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