Developments in Photoelasticity: A renaissance

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.

Key Features:

  • Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodology

  • Explains phase-shifting methods that are robust enough to allow the reader to implement them with ease.

  • Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.

  • Provides carrier fringe analysis tools for quantifying low stress field information for special applications.

  • Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.

  • Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics
"1138260639"
Developments in Photoelasticity: A renaissance

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.

Key Features:

  • Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodology

  • Explains phase-shifting methods that are robust enough to allow the reader to implement them with ease.

  • Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.

  • Provides carrier fringe analysis tools for quantifying low stress field information for special applications.

  • Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.

  • Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics
30.49 In Stock
Developments in Photoelasticity: A renaissance

Developments in Photoelasticity: A renaissance

by Krishnamurthi Ramesh
Developments in Photoelasticity: A renaissance

Developments in Photoelasticity: A renaissance

by Krishnamurthi Ramesh

eBook

$30.49  $40.00 Save 24% Current price is $30.49, Original price is $40. You Save 24%.

Available on Compatible NOOK devices, the free NOOK App and in My Digital Library.
WANT A NOOK?  Explore Now

Related collections and offers


Overview

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.

Key Features:

  • Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodology

  • Explains phase-shifting methods that are robust enough to allow the reader to implement them with ease.

  • Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.

  • Provides carrier fringe analysis tools for quantifying low stress field information for special applications.

  • Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.

  • Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics

Product Details

ISBN-13: 9780750324724
Publisher: Institute of Physics Publishing
Publication date: 10/21/2021
Series: IOP Series in Advances in Optics, Photonics and Optoelectronics
Sold by: Barnes & Noble
Format: eBook
Pages: 225
Sales rank: 747,704
File size: 23 MB
Note: This product may take a few minutes to download.

About the Author

Professor K Ramesh is currently the K Mahesh Chair Professor at the Department of Applied Mechanics, IIT Madras and a Fellow of the Indian National Academy of Engineering. He received the Zandman award in 2012 for outstanding research contributions utilizing photoelastic coatings and has been a member of editorial boards of Optics and Lasers in Engineering and Strain since 2000. He has developed software such as P_Scope®, DigiTFP®, DigiPhoto and PSIF for photoelastic analysis and innovative e-books with extensive animations for teaching several courses.
From the B&N Reads Blog

Customer Reviews